Spin-dependent processes at the crystalline Si-SiO2 interface at high magnetic fields
نویسندگان
چکیده
D. R. McCamey,1,* G. W. Morley,2 H. A. Seipel,1 L. C. Brunel,3 J. van Tol,3 and C. Boehme1,† 1Department of Physics, University of Utah, 115 South 1400 East, Room 201, Salt Lake City, Utah 84112, USA 2London Centre for Nanotechnology and Department of Physics and Astronomy, 17-19 Gower Street, London WC1H 0AH, United Kingdom 3Center for Interdisciplinary Magnetic Resonance, National High Magnetic Field Laboratory, Florida State University, Tallahassee, Florida 32310, USA Received 24 May 2008; published 2 July 2008
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